Used TEL / TOKYO ELECTRON Lithius i #9361961 for sale

TEL / TOKYO ELECTRON Lithius i is a high-precision, advanced photoresist equipment used for the deposition of photoresist material. This system is used in the semiconductor manufacturing process where photoresist material is applied on the substrate of wafers. The unit integrates cutting-edge precision technologies including lithography to enable accurate patterning of the photoresist. TEL Lithius i employs precision alignment and accurate scanning motions along with precise dose control. This helps the machine to make high-resolution patterns that are suitable for use in next generation semiconductor devices. The tool also offers a high image won accuracy as well as a reliable fine pattern control for superior performance. TOKYO ELECTRON Lithius i is equipped with the latest application control software that ensures high throughput and improved design capability. This ensures that the results obtained are of the highest quality. In addition, Lithius i provides user-friendly operation that results in improved productivity and reduced costs. The asset offers a wide variety of components that help to ensure the accuracy and reliability of the photoresist application model. These components include a precision control mechanism, an exposure dose monitor, and a motion control module. Additional features offered by the equipment include a full camera module, automatic exposure mode, optics positioning, and a dual-beam alignment system. TEL / TOKYO ELECTRON Lithius i also features multiple alignment and registration correction functions which help to ensure that the photoresist is applied in an accurate and precise manner. This allows for better accuracy when building ICs on the wafers. The unit also features advanced data logging that helps keep an accurate record of the photoresist parameters used during each operation. In conclusion, TEL Lithius i is an advanced photoresist machine that provides users with an effective and reliable solution for the deposition ofphotoresist material on integrated circuit (IC) wafer substrates. The tool features advanced precision technologies for lithography, precise tracking and alignment control, image won accuracy, and a full camera module. As a result, users can be confident in their photoresist application processes.