Used TEL / TOKYO ELECTRON Lithius i+ #9391713 for sale

TEL / TOKYO ELECTRON Lithius i+ is a photoresist equipment used in photolithography, a key technology in the manufacture of semiconductors, microprocessors and digital displays. It works by producing a high-fidelity two-dimensional mask of a design that is then transferred to a silicon or other material wafer. TEL Lithius i+ uses a unique triple-exposure technique that combines advanced photomask creation, precision alignment and highly accurate terminal processes for the production of superior structures with exceptional edge acuity and good line widths and profiles. The system applies photoresist material to a film or plate for printing and manufacturing components. At the same time, it provides exposure to a radiation source such as UV or electron streams, removing and/or forming the targeted material in a desired pattern. The unique three-exposure technique of TOKYO ELECTRON Lithius i+ allows for flexibility in creating structures of differing levels of complexity across the wafer or substrates with minimal distortion. It also results in a very small degree of misalignment, allowing for accurate line widths with little or no rounding. Lithius i+ also features advanced targeting and fine measurement technologies with low-voltage exposure, which helps to improve consistency of results from one process to the next. Additionally, it's relatively low cycle cost per shot makes it economical and easy to use for both small and large-scale processes. The unit additionally utilizes proprietary software algorithms to enable the high-accuracy projection alignment during the exposure process. This allows for highly precise transfers of patterns onto aimed substrates. The user-friendly control environment delivers real-time performance feedback and results to monitor the progress and quality of the application processes. Overall, TEL / TOKYO ELECTRON Lithius i+ is an advanced photoresist machine that provides a reliable platform for processes requiring high resolution and accuracy in pattern fabrication. It's combination of high-resolution deposition techniques, state-of-the-art alignment systems and advanced software make it an ideal choice for applications where high precision and low cost manufacturing standard compliance are both essential.