Used TEL / TOKYO ELECTRON Lithius Pro-I #9161715 for sale

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ID: 9161715
Wafer Size: 12"
Vintage: 2008
Coater / Developer, 12" Software Os: Windows Wafer type: Non-SMIF Wafer of type: Notch at 6 o' clock Automation online component: SECE Inline flow: Right Includes: (1) CSD & FEX (1) PRB-F (1) PRB-B (1) IPRB (1) IFBS (1) AC Power box (1) Cot cabinet (2) Dev cabinets (2) STCHs (1) Cable (1) Tube cart (5) Profiles (1) IFBS Rail (1) HMDS Cart (2) Fex doors (5) Boxes 2008 vintage.
TEL / TOKYO ELECTRON Lithius Pro-I is a photoresist equipment designed for thin film process applications. The system uses lithography to selectively expose regions of a thin film material to a light source. The exposed regions are then chemically etched away, creating a microstructure in the thin film material. The unit is made up of components including an optical base, an excimer laser, a polychromator, and a wafer stage. The optical base ensures precise positioning of the laser relative to the surface of the thin film material, and the excimer laser provides a high-intensity ultraviolet light which is used to expose the photoresist. The polychromator further refines the laser characteristics and allows for multiple wavelengths to be emitted from the laser. The wafer stage provides a platform for moving the thin film material relative to the laser, allowing for precise positioning of each exposure. Once the photoresist is exposed to the laser, it is processed in an acid-bath developer, which selectively removes the exposed portions of the photoresist. This reveals the underlying layers of material which can then be etched away selectively to create a microstructure in the thin film material. TEL Lithius Pro-I is a versatile and reliable machine allowing for precise patterning of thin film materials. It offers superior performance over more conventional photolithographic processes due to the capabilities of the excimer laser, use of multiple wavelengths, and ability to move the wafer during exposure. The tool also offers automated controls, allowing for easy operation and the ability to accurately reproduce patterns. Additionally, a variety of software tools are available to assist in the design and processing of patterns, making them easy to create and optimize. TOKYO ELECTRON LITHIUS PRO I is an ideal choice for thin film process applications where precision, accuracy, and high-quality patterning are required.
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