Used TEL / TOKYO ELECTRON Lithius Pro #293603809 for sale

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ID: 293603809
Wafer Size: 12"
Vintage: 2011
Coater / Developer system, 12" Process: ArF Dry Factory interface: (5) FOUPs CIM: ECS / GEMSECS / GEM Options: LynxOS / TEL Chiller T/H Controller Coater and developer cabinet Resist cabinet A/C Power box Handler: CRA IRAM (3) PRA 2011 vintage.
TEL / TOKYO ELECTRON Lithius Pro is a high-performance photoresist equipment, designed for advanced lithographic operations. It utilizes sophisticated imaging technology and advanced controlling algorithms, enabling it to produce extremely precise photoresists. With the use of cutting-edge optics and progressive automation, this system can provide state-of-the-art lithographic results. The integrated optics unit of TEL Lithius Pro allows lithographers to accurately realize a wide range of resolutions. Its advanced imaging algorithms, optical machine and automated exposure parameters enable it to produce photoresists with extremely fine features and minimal distortions. Furthermore, an integral feedback tool helps lithographers to monitor and maintain the asset's stability. The model also utilizes extremely fast controllers, resulting in both high throughput and low latency. TOKYO ELECTRON Lithius Pro provides automated control over exposure parameters, including exposure time, pixel size and optical densities. It also offers a variety of options for controlling the photoresist, such as shape and edge definition. This equipment can be configured to control parameters on a pixel by pixel basis, allowing for exceptionally fine control. Lithius Pro is also designed for easy maintenance and repair, with many easily replaceable components. It offers tools for monitoring the system's performance over time, including an embedded Quality Control unit, which helps identify and fix potential problems quickly. Overall, TEL / TOKYO ELECTRON Lithius Pro is a high-quality, advanced photoresist machine. By combining sophisticated control systems and powerful imaging technology, this tool is perfect for lithographers wanting to push their photomasks to the next generation of accuracy and resolution.
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