Used TEL / TOKYO ELECTRON Lithius Pro #293827336 for sale
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TEL / TOKYO ELECTRON Lithius Pro is a state-of-the-art photoresist equipment that is designed to create precision lithography masks for semiconductor devices. TEL Lithius Pro is equipped with a proprietary research-grade chlorinated polyvinyl alcohol (PVA) photoresist and has several advanced features that are ideal for university research. TOKYO ELECTRON Lithius Pro photoresist system utilizes a liquid form of the PVA photoresist, allowing for greater design flexibility and the ability to tailor photoresist masks to a particular design. This photoresist unit promises to deliver consistent and reliable results with every use. The photoresist is applied to the device wafer with a programmed wafer stage, which allows the researcher to accurately control the exposure time and dose. In addition, Lithius Pro can be tuned to rapidly scan the lithography mask or repeat a particular design. The other notable feature of TEL / TOKYO ELECTRON Lithius Pro is its Bake-Processing Machine (BPS), which is designed for pattern defined medium-high density lithography. This allows researchers to efficiently produce high-resolution patterns and films. The BPS also features; a fusion thermopile that boasts a high-frequency control; an auto-time and temperature-controlled baking plate; and a software-controlled substrate. These features help to create fine detailed lithography masks very quickly and efficiently. Finally, TEL Lithius Pro photoresist tool features a fully-monitored operation environment to provide a safe and reliable setting for the researcher to work. All the photoresist systems are equipped with protective UV-filtering shields and an inert nitrogen exhaust asset for user protection. The model also contains environmental sensors that monitor fluid levels and temperatures to ensure a consistent operation. In summary, TOKYO ELECTRON Lithius Pro photoresist equipment is an advanced research-grade photoresist system with many features that make it ideal for lithography research in universities. Its PVA photoresist liquid offers greater design flexibility; the Bake-Processing Unit guarantees high-resolution patterns and films; and its environmental protection features ensure a safe and reliable operation.
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