Used TEL / TOKYO ELECTRON Lithius Pro #9283145 for sale

TEL / TOKYO ELECTRON Lithius Pro
ID: 9283145
Systems 2004 vintage.
TEL / TOKYO ELECTRON Lithius Pro is an advanced photoresist equipment used in the manufacture of semiconductor integrated circuits and microelectronic devices. It is a key tool in the production of semiconductor wafers, and is used to create thin deposits or densities of various materials that are then etched and removed from the wafer to form integrated circuits. The system is unique because of its advanced sol-gel technology, which enables users to create finer features and increase the accuracy and resolution of deposition and etching. This makes it ideal for producing smaller, more complex structures and designs on integrated circuits. The unit also features a closed-loop resist control, which allows the user to accurately control parameters such as exposure time and vapor pressure within the machine. TEL Lithius Pro can also be used for a variety of processes, such as coating, patterning, lithography, and curing. Its coating capabilities include spin coating, pneumatic spray, and slot die systems. The tool also features an advanced OMERLOT (Output Mode Electric Resist Layer) process which enhances the accuracy of resist layer formation. In addition to its coating and lithography capabilities, TOKYO ELECTRON Lithius Pro also includes features which enable the user to manipulate the surface of the substrate material. This includes oxide removal, CMP (Chemically Mechanical Polishing), and etch back. All of these processes can be used to modify the surface topography of the semiconductor wafer, allowing more intricate structures to be formed. Finally, the asset features an advanced curing model which utilizes high-frequency microwaves to reduce curing time and reduce costs associated with the production process. This curing equipment is also capable of rapid tempering cycles which help to ensure that all layers are adhered properly and remain uniform in appearance. Overall, Lithius Pro is a powerful photoresist system with a variety of capabilities that make it a key tool in semiconductor production. It offers advanced coating and lithography abilities as well as surface topography control, curing, and other features which enable the user to create increasingly complex designs and circuit structures.
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