Used TEL / TOKYO ELECTRON Lithius #293595668 for sale

TEL / TOKYO ELECTRON Lithius
ID: 293595668
Wafer Size: 12"
Vintage: 2006
Coater / Developer system, 12" 2006 vintage.
TEL / TOKYO ELECTRON Lithius is an advanced photoresist system designed to help manufacturers etch detail into surfaces with minimal waste and reduced costs. It utilizes ultraviolet (UV) and visible (VIS) light to image complex patterns on a variety of substrates including GaAs, SiO2, SiN and more. The system is composed of several components, including a light source, optics, a steering mirror, and a lithography unit. The light source is a high-output UV/Visible (U/V) laser which has excellent wavelength resolution, greatly improving its accuracy and fidelity, while its optics are designed to project a uniform image. The steering mirror, which is a highly-sensitive, automated device, is connected to the lens to ensure accurate pattern projection onto the substrate. When the light source and optics have been properly configured, a photoresist is applied to the substrate to be imaged. Photoresists are a special type of chemical that are sensitive to UV and visible light and undergoes a chemical reaction when exposed. After exposing the resist to the laser, the desired pattern can be developed and the resist is then cleaned off, leaving behind the desired etch pattern. The use of TEL Lithius in photolithography operations offers significant advantages compared to traditional photolithography. It's faster, more accurate and can project a much higher resolution pattern than conventional photolithography. Additionally, it's less expensive, uses a considerably lower amount of photoresist and other consumables and is much cleaner since the photoresist evaporates instead of being scraped away. TOKYO ELECTRON Lithius is a high-performance photoresist system that can be used by manufacturers to etch intricate patterns on substrates more accurately and economically than traditional photolithography. It's versatile, dependable, and can produce a high-resolution pattern with minimal waste of photoresist and other consumables. As such, it is an ideal choice for high-volume production of substrates with intricate patterns used in various industries.
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