Used TEL / TOKYO ELECTRON Lithius #293609337 for sale

TEL / TOKYO ELECTRON Lithius is a photoresist coating equipment designed for use in Sub-Micron Semiconductor Device Processing. Made by Japanese-based industrial supplier, TEL, TEL Lithius is an advanced photoresist system designed to replicate, slice, and separate sub-micron scale circuits onto semiconductor wafers. This photoresist unit is the cutting-edge of semiconductor device processing, providing a meticulous process for creating intricate, miniature circuitry. The machine works by first coating the semiconductor wafers with a thin layer of photoresist material. This materials then undergoes a brief spin-coating process to level the film, before being exposed to ultraviolet light - this exposure 'writes' down the specifications onto the exposed film. The areas of the photoresist material which have been struck by the ultraviolet light become hardened and resistant to etching. The photoresist is then washed to remove any unhardened material - this washing process also 'fixes' the specifications into the resist layer. The photoresists which are used are specially formulated to adhere to the exacting pattern tolerances, required for sub-micron semiconductor device processing. The components of each photoresist formulation can be tailored to meet the needs of each substrate, to ensure the highest possible resolution and quality both during the exposure and processing stages. After the coated wafer is exposed to the ultraviolet light and then washed, the photoresist layer is then ready for 'development'. This step involves subjecting the resist layer to a reaction that removes any unhardened, unprotected sections. The consequent 'developed' resist layer that remains is a representation of the specified circuit, ready for etching onto the device. Finally, after the etching process has been completed and the device is ready to be readied, the photoresist layer is stripped and removed. TOKYO ELECTRON Lithius tool uses special techniques that ensure the photoresist is never over-stripped, avoiding any damage to the device. In summary, Lithius photoresist asset provides a precise and intricate process used to create sub-micron scale circuitry onto semiconductor wafers. It utilizes specially formulated photoresists and a spin-coating process, so that the semiconductor devices can be exposed to ultraviolet light and be 'developed' in order to replicate the specified circuit. It is a cutting-edge model that ensures the highest quality of miniature circuitry for sub-micron scale semiconductor devices.