Used TEL / TOKYO ELECTRON Lithius #293610403 for sale

TEL / TOKYO ELECTRON Lithius
ID: 293610403
Wafer Size: 8"-12"
Coater, 8"-12" Inline: 150 WPH Craft: Immersion, ArF, KrF, i-line Substrate: Si, glass.
TEL / TOKYO ELECTRON Lithius is a photoresist processing equipment that provides superior performance in a range of advanced lithography applications. It features a fully automated and integrated system, allowing users to easily configure a single tool to process various wafer structures with different photoresist materials. The unit uses a Next Generation Optical Exposure machine, or NEXTGen, to expose photoresist to light at a frequency regulated for enhanced patterning accuracy down to 0.4 μm lines and spaces. The tool is designed to easily integrate photomasks, steppers and scanners to enable optimal flexibility in patterning device and circuit designs. TEL Lithius' advanced wafer handling capabilities further enable seamless and efficient substrate transfers from load ports to process. The asset is designed for superior yield control and cost effectiveness. It uses an advanced Substrate Uniformity Model (SUS) for defect sensitivity and maximizes yield control with minimized part-of-field dependant uniformity variance. In addition, the equipment uses a plurality of advanced PR films that require little wafer warpage while allowing high resolution imaging. TOKYO ELECTRON Lithius' innovative features also address minimization of wafer-level costs. It is designed so that a single lithography system can handle various process steps and resist films, eliminating the need for additional mainframe and software investments. In addition, it minimizes operational costs by combining efficient control of photoresist and etch ingredients. Over its long history, Lithius photoresist unit has consistently offered reliable, cost-effective and efficient solutions for advanced lithography processes. Its innovative features and advanced on-board systems effectively balance cost and performance to ensure superior yield control and improved process flow. Its highly automated, integrated machine eliminates the need for multiple investments, streamlining workload and creating a performance edge for device manufacture.
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