Used TEL / TOKYO ELECTRON Lithius #293615016 for sale

TEL / TOKYO ELECTRON Lithius is a photoresist equipment designed for use in lithography processes for the manufacturing of microelectronics components such as semiconductors and integrated circuits. This system is well-suited for high volume, large area exposure processes and is capable of processing a wide array of substrates. The unit utilizes a variety of excimer and LED UV light sources from 200 to 400 nanometers in wavelength and allows for exposure doses from 0.5 to 10 mJ/cm2. TEL Lithius machine features automatic exposure optimization, which provides excellent process repeatability and accuracy for critical features. This tool is equipped with a high-performance, highspeed laser scanner that is capable of scanning areas as large as 40 inches. The exposure accuracy of the scanner is 0.765 microns and its scanning speed can reach up to 6 inches per second. The asset also includes a high-performance exposure controller with many different functions, such as dose control, mask aligning, and pattern inspection. The control model ensures high productivity by allowing for simultaneous exposure of multiple field positions and supports a range of feature sizes down to 0.25 micron. Additionally, TOKYO ELECTRON Lithius equipment is compliant with SEMI standard E75, which allows for a variety of development methods, including wet or dry development. Lithius system has several features that safeguard the quality of the microelectronic components produced. Sensors on the unit detect the presence of dust and other particles and alert the operator if any are present. Additionally, the machine is designed to reduce power consumption and its self-cleaning UV source control tool prevents the UV source from producing a faulty pattern due to dust contamination. Finally, the asset features an additional open development option, which allows for additional flexibility in the photoresist process. Overall, TEL / TOKYO ELECTRON Lithius photoresist model is an effective tool for microelectronic component production. It is well-suited for high volume manufacturing and is capable of producing consistent, reliable results thanks to its automated exposure optimization and dust contamination detection systems. Additionally, its SEMI standard compliance and openness to a variety of development methods increase the flexibility of the equipment, allowing it to conform to the individual needs of the production process.