Used TEL / TOKYO ELECTRON Lithius #293615289 for sale
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ID: 293615289
Wafer Size: 12"
Vintage: 2006
Coater / Developer system, 12"
2006 vintage.
TEL / TOKYO ELECTRON Lithius is a lithography equipment that enables deep ultraviolet (DUV) lithography using a photoresist material. It utilizes a special type of photoresist system, referred to as an organic photoresist (OPR), which is extremely effective when used in ultraviolet light lithography applications. This unit is particularly suited to the production of small and complex structures, which are present in industries that require the highest levels of accuracy in their end-products. In the process of lithography, the photoresist film is firstly exposed to a UV light source. The light source is defined by the film type and application, such as DUV or DUV-overlay. During exposure, the molecules of the photoresist molecule are broken down and the exposed molecules are removed. This process removes the unwanted areas of material from the photoresist film, creating the desired pattern and creating a pattern-on-film. TEL Lithius machine is then able to accurately transfer the pattern-on-film into the photosensitive workpiece material. The photosensitive workpiece is first exposed to a high-resolution laser, which accurately and precisely registers the pattern-on-film onto the desired substrate. The registered pattern is then transferred onto the substrate, outlining the desired structure. TOKYO ELECTRON Lithius tool is specifically designed to ensure the accuracy and reproducibility of the pattern-on-film operation through its multi-step application process, which includes high-definition resolution scanning, auto-correction, and a high-performance etchant. Through this process, the accuracy and precision of the patterns transfers onto the substrate material, ensuring a highly reproducible process. Due to its accuracy, precision and reproducibility, Lithius asset is particularly suited for a variety of applications, including developmental and commercial wafer manufacture, pattern verification, repair, as well as lithography for semi-conductor manufacturing. The model is also very adaptable, able to be used through various processes and applications, such as etching, inspection and various surface treatments. Utilizing TEL / TOKYO ELECTRON Lithius equipment ensures that high levels of accuracy, detail and reproducibility can be achieved in a variety of fields, with DUV photoresist material providing a versatile and dependable application for a range of electronics manufacturing processes. Its compact design, high resolution and ability to produce complex patterns give the user the proton beam to lithography technology, ideal for those in need of manufacturing with the highest degree of accuracy.
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