Used TEL / TOKYO ELECTRON Lithius #293763044 for sale

TEL / TOKYO ELECTRON Lithius is a multi-angle imaging photoresist equipment designed and manufactured by TEL (TOKYO ELECTRON) to enable semi-conductor manufacturers to accurately fabricate fine structures and perform lithographic patterning operations. This system works by laser scanning a surface at various angles and projecting an image on the substrate with a substrate stage that has a high precision. The substrate stage is able to vary the speed and direction, allowing for a wide range of parameters to be used in the etching and patterning process. Then, light-sensitive photoresist is applied to the substrate and the image scanned from the laser beam will form a pattern on the photoresist. This pattern, along with the original lens scans, is employed with an electron beam to selectively etch certain areas of the substrate. TEL Lithius unit has high resolution capabilities, allowing patterns of features with a size of up to 28 nanometers to be created consistently. With this extremely fine resolution and high accuracy, this machine is able to maintain a high degree of control of the etching and patterning processes. In addition, this tool also has multiple patterning levels, enabling multiple layers of structure to be fabricated on the substrate. This allows for a wide variety of modifications and refinements in the layout, which can be extremely helpful in addressing potential design flaws. While TOKYO ELECTRON Lithius asset is designed for use in semi-conductor fabrication, it can also be used for a variety of applications involving etching, photolithography, or coating processes. This secure, reliable model also has advanced monitoring capabilities that ensure each stage of the process runs smoothly. It also has multiple communication ports for secure communication with other systems, as well as a number of other reliable safety measures. Lithius equipment is an incredibly reliable and secure solution for performing a variety of etching, photolithography, and coating processes. Its advanced features, high resolution capabilities and various safety features make it an excellent source for semi-conductor fabrication.