Used TEL / TOKYO ELECTRON Lithius #293766146 for sale

TEL / TOKYO ELECTRON Lithius
ID: 293766146
Coater / Developer system Hard Disk Drive (HDD).
TEL / TOKYO ELECTRON Lithius is a high-precision photoresist equipment designed for use in integrated circuit manufacturing processes. It has a variety of features that allow it to produce reliable and repeatable results, while also being able to accommodate the most advanced photoresist materials. The system features two different types of chambers, the LCT (Lithium Chloride plating Tank) and the PRT (Photoresist-on-Substrate Tank) along with a series of other supporting chambers. The LCT is used to apply coatings of lithium chloride to the wafer, while the PRT is then used to apply the photoresist and develop the layer. This is done using a series of precisely programmed light and chemical movements, ensuring that the layer is evenly applied and meets the exact thickness and patterning requirements. Photoresist coatings are developed using a variety of exposure methods, such as masking, deep- UV, or lasers. These methods allow for precise control over the layer's thickness and pattern, enabling extremely intricate and customized designs to be created. The unit also features an alignment machine that allows it to easily line up the PRT and LCT tanks with the wafer, ensuring that the photoresist is applied in the correct location. Additionally, several different cooling systems are included, helping to ensure that the photoresist does not get too hot during the exposure or development process. Finally, TEL Lithius also is equipped with a number of automated features, allowing for greater consistency and productivity. This includes automated wafer handling, photoresist application, coating thickness control, and alignment. This ensures that each wafer is given the same level of precision, reducing the risk of errors and ensuring repeatable performance. Overall, TOKYO ELECTRON Lithius is an extremely capable and reliable photoresist tool. Its features, including automated handling, precise alignment, and advanced exposure and development, are ideal for creating intricate and detailed photoresist layers that are well-suited for the most demanding manufacturing processes.
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