Used TEL / TOKYO ELECTRON Lithius #293767330 for sale

TEL / TOKYO ELECTRON Lithius is a sophisticated photoresist equipment designed to enable enhanced photolithography precision, speed and accuracy. It provides lithographers with the highest levels of performance and the greatest control over their photolithography processes. TEL Lithius system comprises two main elements - an lithography tool and a photoresist unit. The lithography tool is designed to rapidly expose, develop and etch a pattern onto a targeted substrate. It is equipped with high-precision motors, optics, image capturing and data recording systems and can handle target substrates as large as 300x300mm. The photoresist machine is a sophisticated set of resist formulations, with a specific Advanced Composition Efficiency (ACE™) resist formulation process to ensure even exposure and transfer of patterns to the substrate. TOKYO ELECTRON Lithius makes use of a software suite to enable precision control over the process. It includes Pattern Generator software for generating the desired image, Exposure Software for calibrating exposure parameters and Auto- Process software for managing and controlling the entire lithography process. Other features include an auto-correction tool to detect errors and correct them, as well as a asset for archiving image data. Lithius is designed to enable accurate and consistent processing of substrates using a format resolution of 0.8um. It also supports angled exposure and rotational exposure, allowing users to achieve greater flexibility in their design and fabrication processes. The model is designed to be energy efficient, helping to reduce energy costs and overall production costs. It also employs high-speed imaging and scanning technologies, contributing to faster updates and improved throughput. TEL / TOKYO ELECTRON Lithius is also capable of automated inspection, enabling users to review the quality of their photolithography process and ensure that their products feature consistent quality. Overall, TEL Lithius is a sophisticated Photoresist equipment that enables lithographers to easily and consistently achieve the highest levels of precision and accuracy. It provides users with a powerful tool for efficient and effective processing for both prototyping and production.