Used TEL / TOKYO ELECTRON Lithius #293793614 for sale

TEL / TOKYO ELECTRON Lithius is a fully automated photoresist equipment designed for precision photolithography processes. The system provides a wide range of features for efficient resist processing and superior patterning results. It is optimized for high-throughput production and takes advantage of the latest advancements in lithography technology. The unit allows for the processing of up to eight types of resist on large and small substrates at a single time, with an automated thickness control mechanism ensuring process uniformity and high accuracy. The machine consists of a light source, an optical stage, and a platform for positioning the substrate aligned with the mask stage. The optical stage includes a precision alignment tool and a stepper that is used to move the substrate. The light source is responsible for providing light of the required wavelength and intensity level and is capable of both standard and advanced lithography processes. The asset has an array of advanced features, including a special multi-layer, resist processing module and a custom-designed conveyor that automatically processes large-area substrates. The automatic wafer positioning model is integrated with a unique optical scanner and a smart cleaning equipment. It is also equipped with a motorized mask stage, an integrated vacuum system, and an auto-tuning feature. The unit provides excellent protection from contamination and is filled with a special protective gas to ensure long-term maintenance. It is designed with a simple user interface and a touch-screen display, enabling fast and accurate adjustments of parameters. The machine also has a low-vibration design, partially eliminating the need for vibration dampening. Photo-alignment, focus-finding and lens-focusing functions are integrated into the tool for superior patterning results. The asset is fast and efficient, offering operators unparalleled performance and flexibility. It is compatible with a wide range of photoresists and is designed to meet the needs of a wide variety of industries. It is an ideal way to optimize photolithography processes, improving throughput and maintaining superior precision.