Used TEL / TOKYO ELECTRON Lithius #9105630 for sale
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ID: 9105630
Process Block Robotics Arm
P/N: PRA ASSY
Includes:
010-204079-11 FORK(200),PRA 1
5010-307799-13 BLOCK(200),PRA 3
020-005778-1 CAP SCREW CBSST4-8 3
020-002601-1 BAIND SCREW M3*4 SUS304 6
032-000585-1 FLAT WASHER M4 1L SUS304 3
5010-308529-11 PLATE(1-200),HEAT SHILED 1
5010-406949-11 SUPPORT(X-1) 1
5010-308530-11 PLATE(2-200),HEAT SHILED 1
5010-302404-11 FRAME 1
020-000028-1 CAP SCREW M4*6 SUS304 2
020-007602-1 TORX CAP SCREW M4*8 SUS304 2
020-002913-1 CAP SCREW M4*8 SUS304 W/SPR & FLAT WASHER 2
032-000011-1 FLAT WASHER M4 SUS304 POLISHED ROUND 2
032-000058-1 SPRING WASHER M4 SUS304 2
5010-101146-12 BASE,(X)UPPER 1
5010-101147-13 BASE(X),LOWER 1
5004-400017-12 ARM(X1-1) (509510045511 1
5010-305344-11 SUPPORT(X1-1) 1
5004-400018-11 ARM(X2-1) (509510045511 1
5010-306532-11 ARM(X2-2) 1
5010-305345-12 SUPPORT(X2-1) 1
5004-400019-11 ARM(X3-1) (509510045511 1
5010-306533-11 ARM(X3-2) 1
5010-305346-11 SUPPORT(X3-1) 1
5004-400015-11 CLAMP,BELT (509510045411 6
5010-401565-12 PLATE 5
5010-404925-11 STOPPER(X-1) 3
5010-404926-11 STOPPER(X-2) 6
5010-305873-11 SUPPORT(X-2) 1
5010-305987-11 SUPPORT(X2-2) 1
5010-306512-12 STAY,SUPPORT 1
5010-405028-11 COVER,CABLE 1
5010-404472-11 COVER,SENSOR 1
5010-405427-11 PILLER(1) 2
5010-405428-11 PILLER(2) 4
5010-307086-12 PLATE(1),SIDE 1
5010-306535-12 PLATE(2),SIDE 1
5010-306536-12 PLATE(3),SIDE 1
5010-404927-11 BLOCK,AJUST 2
5010-405430-12 SHUTTER(X) 3
5010-405429-12 BRACKET,SUPPORT 1
5010-408761-11 SHUTTER(TH) 1.
TEL / TOKYO ELECTRON Lithius is a photoresist equipment designed for exposure of semiconductor substrates and other wafer-level devices. Photoresist systems allow for the creation of various patterns on substrates, enabling the development of high-performance electronic components with high precision and accuracy. TEL Lithius system employs an EUV (Extreme Ultraviolet) light source to enable lithography of 0.3um device features and detect mask defects as small as 0.2um in size. The unit features an automated mask inspection chamber which utilizes precise scanning optics with low aberration (blurring) to detect defects in the mask. The machine also uses a retention magnet tool to keep the mask from shifting during exposure. The asset supports various exposure modes, allowing for optimal patterning of substrates. For example, one-shot exposure mode enables simultaneous exposure of multiple devices with one mask. High resolution spot exposure mode enables exposure of single pixels with a higher resolution than is possible with conventional stepper systems. In addition, multiple exposure mode enables the adjustment of light intensity to suit the conditions of the substrate. TOKYO ELECTRON Lithius model is designed for easy operation. It has an intuitive user interface, designed to be user friendly, allowing operators to quickly master the equipment. It also has a high speed and highly precise autofocus feature, providing faster focus time and improved accuracy. In addition, the system features an automatic calibration feature, eliminating the need for manual calibration. Finally, Lithius unit is highly reliable, with modular architecture optimized for high speed and performance. It has a flexible expandable design, allowing the machine to be upgraded to meet future requirements. The tool also has built-in environmental and safety measures, providing a safe and healthy working environment for all users.
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