Used TEL / TOKYO ELECTRON Lithius #9111800 for sale

ID: 9111800
Front Opening Unified Pod BODY ASSY, P/N: 5085-413307-11 CLAMP ASSY, P/N: 5085-413308-11 DRIVE ASSY, P/N: 5085-413309-11 HEAD ASSY, P/N: 5085-413312-11 PANEL ASSY, P/N: 5085-413313-11 STAGE ASSY, P/N: 5085-413314-11 SENSOR ASSY PLASEMENT, P/N: 5085-413316-11 CABLE ASSY.
TEL / TOKYO ELECTRON Lithius is a photoresist equipment developed by TEL (TOKYO ELECTRON). It is a photolithography system designed to pattern semiconductor substrates with ultra-fine features. It combines a Synchronized High Resolution Laser (SHRL) and unique optical integration technology to achieve exceptional photoresist processing and image transfer. The SHRL is a laser-illumination source with simultaneous exposures and functions that control light intensity, cycle frequency, and exposure time. This laser is capable of producing sub 10 nm patterns - the smallest available in any lithography unit. The machine is also capable of direct write photolithography, which obviates the need for traditional calibrations and mask layers. TEL Lithius photoresist tool also features fully integrated optics technology, which facilitates high precision imaging over large areas with excellent contrast and resolution. It has a closed-loop control asset that ensures repeatable results with every exposure. With its advanced features, it provides higher material utilization and improved photoresist durability. The model also includes Image Director software, which provides translation, rotation and scaling of patterning layers for complete control over the design process. Other features include autofocusing to ensure accurate focus for every pattern and direct-readout measurement to easily check parameters for process optimisation. Overall, TOKYO ELECTRON Lithius photoresist equipment is a powerful photolithography tool built in a small, easy-to-use system. It features advanced laser technology and highly integrated optics, allowing users to achieve superior patterning performance with nanoscale resolutions and features. It is the ideal solution for applications requiring small feature sizes and precision imaging.
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