Used TEL / TOKYO ELECTRON Lithius #9112797 for sale

ID: 9112797
WCPL/TRS Water Controlled Chill Plate Process Stations Part Numbers: 5087-401690-18 BASE ASSY, MID 5087-401686-17 BASE ASSY, BACK 5087-401687-13 BASE (3P-CPL) ASSY 5085-408087-11 BASE (WCPL) SET, SUPPORT 5085-403233-11 BASE (WCPL) SET, SUPPORT 5085-404679-12 GUIDE (10) ASSY 5085-413028-11 GUIDE (11) ASSY 5085-409705-12 COVER (WCPL) SET 5085-409703-12 COVER (TRS) ASSY 5087-401691-11 PLATE (TRS) ASSY 5087-403214-11 PLATE (TRS) ASSY 5087-403592-14 CWH (HP) ASSY 5087-403596-11 PIN BASE (CWH) ASSY 5087-403633-13 CWH (HP200C) ASSY 5087-403634-11 PIN BASE (CWH200C) ASSY 5085-413143-11 PIN BASE (CWH200C) ASSY 5087-403641-12 CWH (HPB200C) ASSY 5087-403642-11 PIN BASE (CWHB200C) ASSY.
TEL / TOKYO ELECTRON Lithius is a photoresist equipment developed to enable the production of cost-effective, high-resolution masks. This system specifically uses a combination of deep ultraviolet (DUV) illumination and automated image-processing technology to produce masks that are accurate and high-resolution. The basis of the unit is the use of photoresists, which are layers of material that react to light. Photoresists allow the user to precisely control the exposure of material to light, thus providing a means of putting patterns onto a surface. To ensure accuracy, the photoresist is applied in multiple layers, each layer having different absorption characteristics and exposure levels. The light is generated by the photoresist machine's DUV illumination unit, which uses lasers to project patterns onto the photoresist layers. The intensity of the light is accurately and precisely controlled, and the photoresist absorbs light in proportion to its absorption characteristics and exposure levels. After the light is applied, the photoresist is developed, and from this point, processing steps convert the prepared photoresist layer into a mask with the intended design. The key advantages of using TEL Lithius photoresist tool are its accuracy and repeatability. This asset can be used to produce masks with very high resolutions, with features as small as 10 nanometers. Furthermore, the automated image-processing technology helps to ensure that the patterns produced are accurate and repeatable. TOKYO ELECTRON Lithius photoresist model also produces masks that are cost-effective. Its lasers can be used to create multiple masks at a time, reducing the costs of manufacturing. Additionally, the equipment produces efficient resource utilization, with its automated processes using minimal materials and energy. Overall, Lithius is a reliable and cost-effective photoresist system that enables the production of precise and accurate masks. Its combination of DUV illumination and automated image-processing technology ensures consistent results and efficient resource utilization. As such, this unit is well-suited for the production of high-resolution masks for use in various applications.
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