Used TEL / TOKYO ELECTRON Lithius #9218117 for sale

TEL / TOKYO ELECTRON Lithius
ID: 9218117
Wafer Size: 12"
Vintage: 2005-2006
Track systems, 12" 2005-2006 vintages.
TEL / TOKYO ELECTRON Lithius is an innovative photoresist equipment. It is a comprehensive tool set designed to facilitate efficient lithography processes for the manufacture of semiconductor components. Photoresist systems allow for rapid prototyping and development for various types of circuits and components. TEL Lithius system utilizes advanced chemical-mechanical planarization technology. This technology works by creating a level and uniform surface on the substrate. This is achieved by using an abrasive pad that is slowly passed over the substrate and constantly monitored by an optical detector in order to remove any defects or inconsistencies. After the substrate is polished, a photoresist is applied to the surface, in a thin uniform layer. This allows a pattern to be etched into the substrate layer. Subsequently, a special etch process is used to precisely remove any undesired material from the surface. The result is a precisely patterned substrate layer with a high degree of accuracy. TOKYO ELECTRON Lithius unit also includes a comprehensive set of imaging and imaging analysis tools to assist in the development of semiconductor components. These tools can be used to obtain patterning parameters, such as linewidths, angles, overlay, and photoresist thickness. This information can then be used to modify or fine-tune the pattern, ensuring a precisely etched component is created. For improved mask alignment, Lithius also provides a comprehensive set of stepper-alignment modules and realtime cross section imaging tools. TEL / TOKYO ELECTRON Lithius machine is an invaluable tool for semiconductor component production, providing precise patterning capabilities within tight design accuracies. The tool is suitable for use in the production of the latest high-end semiconductor devices, such as memory and processor chips. It also provides the capability for rapid prototyping and subsystem development.
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