Used TEL / TOKYO ELECTRON Lithius #9274980 for sale
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ID: 9274980
Wafer Size: 12"
Vintage: 2007
(2) Coater / (5) Developer system, 12"
CANON FPA 5500 iZa included
2007 vintage.
TEL / TOKYO ELECTRON Lithius is an advanced photoresist equipment specifically designed to generate extremely high resolution features and patterns in a variety of applications. The system consists of a complex optical path along with a state-of-the-art lithography unit and advanced spinner design. TEL Lithius unit was designed to create very high-resolution features, a term often referred to as high-aspect ratio. This is done by the simultaneous use of both a focused laser and a wide uniform electron beam to render a pattern with very high accuracy and at higher speeds than conventional photoresist systems. TOKYO ELECTRON Lithius machine's unique build elements allow the user to customize the tool on a project-on a-project basis, ensuring that the final product is of highest precision. Lithius asset is best suited for high aspect-ratio features and is capable of producing features down to 20 nanometers. It is also capable of supporting other feature patterns, such as nanopillars, nano-cavities, and micro-electro-mechanical systems (MEMS). The model is reliable and stable, with repeatability and process control capabilities. The range of substrates supports by TEL / TOKYO ELECTRON Lithius equipment includes silicon wafers, glass, polymer, and alumina product. The system swiftly exposes substrates using a broad array of state-of-the-art tools, including a high-speed scanner, optical modules, and advanced computational tools. The unit includes a high-speed vertical transport to keep up with process-cycle times. In addition, the machine features precise project management tools that allow users to remotely control substrate processing, program automation, and offer a variety of tool improvements and process control programs. This advanced asset utilizes a lower photomask size to produce features that are smaller than the equivalent conventional photoresist model. The mask size is able to be reduced due to the advanced optics present in the equipment. As an advanced photoresist system, TEL Lithius unit is an ideal choice for complex, nanofabricated structures with extremely high aspect ratios and small feature sizes. The machine is reliable and provides excellent control over the substrate processes, making it ideal for a wide range of application, from medical science to electronics to automotive industries. The tool includes a variety of sophisticated features, which makes it one of the most advanced photoresist systems on the market.
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