Used TEL / TOKYO ELECTRON Lithius #9274993 for sale

TEL / TOKYO ELECTRON Lithius is a photoresist equipment designed specifically for the lithography process. It can be used to create patterns in masks for various purposes, such as semiconductor chip production and mask fabrication. Photoresist materials are used to produce patterns on the surface of a substrate or device such as a semiconductor chip or a mask. TEL Lithius system is comprised of a scanning electron beam exposure tool, a mask writing unit, and a photoresist material. The scanning electron beam exposure tool is used to draw a pattern of electron beams onto a mask to form a patterned surface. The mask writing machine then processes this pattern to create an image on the substrate or mask. The photoresist material is then applied to the substrate or mask, and the pattern can be transferred onto the substrate or mask. One of the key features of TOKYO ELECTRON Lithius tool is its high resolution. It is capable of submicron resolution, meaning that it can produce patterns with a feature size down to the submicron range, which is essential for many advanced technologies, such as semiconductor chips and chip masks. The asset is also able to create a high aspect ratio structures (the ratio of depth to feature size), which is essential for semiconductor chip production and mask fabrication. Lithius model is also capable of supporting other technologies that require higher resolution, such as 3D printing and contact lithography. The equipment also supports the use of a number of different photoresists, such as epoxy photoresists, polyimide photoresists, and others. This allows the system to be used for a variety of different substrates and masks. In addition, TEL / TOKYO ELECTRON Lithius unit is designed to be user-friendly and easy to use. This makes it ideal for those who are new to photolithography or have limited experience with the technology, as they can quickly learn and become familiar with the machine. Overall, TEL Lithius tool is a comprehensive solution for photolithography and mask writing applications. Its high resolution and support for multiple photoresist materials allows for the fabrication of complex patterns and structures. The asset's user-friendly design also makes it suitable for both experienced and inexperienced users alike.