Used TEL / TOKYO ELECTRON Lithius #9275245 for sale

TEL / TOKYO ELECTRON Lithius
ID: 9275245
Wafer Size: 12"
(2) Coater / (5) Developer systems, 12" CANON FPA 5500 iZa included.
TEL (TOKYO ELECTRON LTD.) TEL / TOKYO ELECTRON Lithius is a photoresist equipment developed by TEL / TOKYO ELECTRON. It is used for the production of semiconductor and display devices, and is designed for optimal productivity and performance in an ultra-clean environment. The system utilizes the latest in optical technologies, which are suitable for high-precision photolithography processes. The unit's optical devices include multiple lenses and microlenses that enable a high image resolution, and its photoresists have a very high contrast when exposed to the ultraviolet (UV) light of the lithographic machine. The tool's high-precision motorized stage is able to accurately move the wafer without vibration, ensuring optimal exposure accuracy even on low-k dielectric surfaces. The asset features the ability to precisely control process parameters such as exposure dose and uniformity, spray distance, pitch, and lithography patterning. This allows for the production of high quality semiconductor devices in an efficient manner. Furthermore, the model is based on a self-contained environment that controls the amount of particulate matter, humidity, and temperature, so that the environment remains clean and ideal for the user. The equipment offers a variety of accessories and options that are designed to optimize performance in different applications. These include micro-processing stations for precise patterning of reticles and masks, stepper and scanner components for automatic lithography operations, and automatic device handlers for high-speed, integrated manufacturing. Moreover, the system includes offline programming features that enable users to develop complex sequences and customized recipes, which can be reproduced quickly and accurately. Overall, TEL Lithius is an ideal solution for the production of semiconductor and display devices. It features the latest optical technology, precise control of process parameters, and environment control capabilities. Furthermore, it includes a range of accessories and options to optimize performance for different applications.
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