Used TEL / TOKYO ELECTRON Lithius #9275250 for sale

TEL / TOKYO ELECTRON Lithius is a specialized photoresist equipment used in a variety of industries within the semiconductor and integrated circuit (I/C) manufacturing process. Photoresist refers to a light-sensitive material used to selectively develop structures within electronic components such as etched or deposited metal. Photoresist is a key step in the lithographic process, which is used to create the different layers and pathways on an I/C chip. TEL Lithius photoresist system uses a photomask which is used to define the features of a semiconductor device. The unit begins by applying a coating of light-sensitive material called a photoresist. The photomask is then placed on top of the photoresist and light is used to expose the defined area's in the photomask. The exposed areas harden or solidify the photoresist while the unexposed areas remain soluble. After the light is removed, a developer solution is applied to the surface to remove the exposed photoresist and thus reveal the pattern of the photomask on the substrate. TOKYO ELECTRON Lithius photoresist machine also incorporates a wet processing tool which can be used to etch the exposed patterns and deposit additional materials. The wet processes includes: photoresist strip, paint strip, resist ash, wet etch, resist strip and etch, deposition and overcoat. The asset offers high levels of process control which allows for repeatable etching and deposition of materials on an I/C chip's surface. Lithius photoresist model also offers improved manufacturing yield as it can identify potential defects and remove them during the wet processing. The equipment also uses computer-controlled imaging to determine the optimal etching and deposition process. This helps to minimize the number of cycles required during the manufacturing process, saving valuable time and money. In summary, TEL / TOKYO ELECTRON Lithius photoresist system is a reliable and efficient unit used within the I/C manufacturing process to develop and deposit materials on their respective layers. The machine offers high levels of process control, higher yield, reduced cycle times and improved defect identification.