Used TEL / TOKYO ELECTRON Lithius #9296906 for sale

TEL / TOKYO ELECTRON Lithius
ID: 9296906
Wafer Size: 12"
Coater / Developer system, 12".
TEL / TOKYO ELECTRON Lithius is a photoresist equipment, designed for use in the production of semiconductor materials. The system is used to etch patterns into a semiconductor wafer in order to create tiny features or components on its surface. The unit employs a 'mask' containing a pre-selected pattern which is placed over the wafer. The wafer is then exposed to high intensity radiation, usually UV light, so that the pattern transfers onto its surface. The process of transferring the pattern is known as lithography, and TEL Lithius employs a unique 'electron beam lithography' approach. This involves the electron beam beam being focused and deflected by a series of photoelectric deflector plates on the specimen, to enable a precise amount of radiation to reach the wafer. This creates fewer atoms on the surface, reducing the etching time required. The machine is capable of delivering ultra-high precision etching, able to create features as small as 0.012 microns over a 36 x 36 mm area. As the beam can be steered with very high accuracy, this highly precise process also enables features with complex, even arcuate shapes to be created. The photoresist level can be adjusted to obtain features of different sizes. Also adjustable is the signal to noise ratio, allowing more control over the pattern and working with any film thickness to produce high resolution results. The tool also features a unique electrode filter which provides high resolution and uniform performance. The low maintenance design of TOKYO ELECTRON Lithius ensures reliability, allowing continuous high quality production for long periods of time. It offers short exposure times, making it ideal for fast cycle production, and the high control of the process ensures very fine and consistent etching. Lithius is highly accurate and reliable, and is the ideal technology for precision etching semiconductors. It enables very high resolution and improved uniformity, making it one of the most suitable systems for producing integrated circuits and other nanotech devices.
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