Used TEL / TOKYO ELECTRON Lithius #9309643 for sale

TEL / TOKYO ELECTRON Lithius photoresist equipment is a robust and reliable opto-electronic lithography tool that uses a step-and-repeat photoresist coating method to accurately pattern substrates. The system starts with a substrate, such as a silicon wafer, being placed on the substrate holder. An ultraviolet light source is used to expose the substrate to pre-defined patterns of exposure. This light source is patterned using a set of reticles, which define the patterns of exposure for each layer of the substrate. The light source is typically set to a wavelength of 365nm. After the substrate is exposed to the UV light, a photoresist layer is spread over the substrate. The photoresist coats the substrate with layers of quantum dots, which react to the exposure pattern of the substrate. After the photo-resist layer is in place, an acid etching process breaks down the quantum dot layers, leaving behind the patterned substrate. TEL Lithius unit can produce a resolution of 0.5 microns, which is suitable for many applications requiring precise processing at a resolution of 1 micron or finer. This makes TOKYO ELECTRON Lithius photoresist systems ideal for applications such as microelectronics, semiconductor processing, and optical media fabrication. In addition to the standard functionality of photoresist systems, Lithius systems also offer automated and programmable features. These include an auto-repeat exposure machine, programmable resists, exposure window optimization, and a film-thickness monitor. These features make TEL / TOKYO ELECTRON Lithius photoresist systems more efficient and reliable than other photoresist systems on the market. The bottom line is that TEL Lithius photoresist tool is a powerful and reliable tool that offers precise, high-resolution, and repeatable patterning. The use of programmable resists and other features make TOKYO ELECTRON Lithius ideal for microelectronics and other high-precision applications.