Used TEL / TOKYO ELECTRON Lithius #9315797 for sale

TEL / TOKYO ELECTRON Lithius is a photoresist equipment for semiconductor device fabrication. It is based on a highly advanced suite of lithography elements, including an LED-based exposure module, a 'shutter' module, a liquid crystal device pattern generator, an optical assembly, and a wafer handling system. Together, these components enable a reliable and consistent delivery of photoresist during the lithography process. The LED-based exposure module utilizes ultra-violet lighting in order to expose photoresist on the surface of a wafer. This module is capable of producing high-quality images with a very short exposure time. In addition to this, it has a precise control of light intensity, allowing for detailed patterning of the photoresist even at smaller feature sizes. The shutter module is used for accurate wafer alignment and exposure control. It is equipped with a motorized unit which enables it to adjust its position in order to block out certain areas from exposure during processing. This ensures that unwanted features are not printed on the wafer during the exposure process. The liquid crystal device pattern generator is used for complex photoresist patterning. It works by combining a high (5μm) spatial resolution pattern generator board with a high speed (kHz) liquid crystal device. This combination enables precise control of the pattern uniformity, which ensures that there are no patterns that appear unevenly on the wafer. The optical assembly of TEL Lithius is composed of high-quality lenses and boards that ensure a very high light intensity and a wide range of wavelengths. Combined with the LED-based exposure module, this provides a very smooth and even exposure of photoresist on the wafer surface. Finally, the wafer handling machine for this tool ensures that the wafers are kept still during the exposure process. This asset is equipped with a controlled magnetic field with xyz motion stages which can be used for precise wafer alignment and positioning. This is important as any movement of the wafer during the lithography process would affect the patterning and lead to deviations in performance. In conclusion, TOKYO ELECTRON Lithius is a highly advanced photoresist model which is composed of a suite of highly advanced components that enable reliable and consistent exposure of photoresist on wafer surfaces. The precision and detail of the patterning that it is able to produce is suitable for even the most complex semiconductor fabrication tasks.