Used TEL / TOKYO ELECTRON Lithius #9351478 for sale

TEL / TOKYO ELECTRON Lithius
ID: 9351478
Wafer Size: 8"
Vintage: 2005
System, 12" 2005 vintage.
TEL / TOKYO ELECTRON Lithius is a photoresist equipment used in both semiconductor and photomask fabrication. This system utilizes a sophisticated direct write laser lithography (DWL) unit in order to create fine patterns of resist. It has a resolution capability of 25nm, making it suitable for use in creating the latest nanoscale features in both devices and photomask fabrication. TEL Lithius machine is the latest in photoresist technology, providing an extremely high-resolution, high-throughput, and low-cost photolithography tool. This asset is versatile enough to be used in a variety of different resist processes, from traditional positive/negative photoresist to dry film photoresist and spin-coat photoresists. In addition to providing advanced lithography, TOKYO ELECTRON Lithius model also offers superior process control with an on-board metrology equipment that monitors the resist reflectivity. The process of resist patterning begins with the illumination of the photoresist. Lithius system utilizes a focused laser with an optic unit that precisely aligns the laser beam to pattern the photoresist. This machine is capable of writing a single resist pattern with the finest feature size of 25 nm. Then an integrated tool of dry cleaning can remove any impurities and other resists from the substrate before the developing step. Once the resist is developed, it is ready to be planarized and metalized with the on-board metrology asset. TEL / TOKYO ELECTRON Lithius's proprietary metrology model provides feedback on the resist reflectivity in order to optimize the substrate's conditions for the metal deposition process. The metrology equipment is also capable of monitoring the etch rate, etch uniformity, and metal deposition rate. Once the photoresist system has completed its resist patterning and metal deposition process, additional post-processing steps such as chemical-mechanical planarization, etching, and deposition of dielectrics may be performed. The resulting device is then ready for packaging and shipment to the customer. In conclusion, TEL Lithius's advanced design and processing capability make it an excellent choice for any semiconductor or photomask fabrication process. With its superior resolution, high-throughput, and metrology unit performance, this machine can help accelerate device creation while reducing cycle times and cost.
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