Used TEL / TOKYO ELECTRON Lithius #9355511 for sale

TEL / TOKYO ELECTRON Lithius is a high-performance photoresist equipment for precision photolithography processes. It is used to create ultra-fine structures on wafer surfaces for the creation of semiconductor components. The system utilizes a laser-based exposure process in six axes and utilizes multi-wavelength UV light sources for precise optical exposure. TEL Lithius consists of a table-top resist-coating unit and laser-based exposure unit. The resist-coating unit provides a variety of coating methods and coat weights to ensure that the photoresist layers are uniform and consistent. The photoresist employed in this machine can vary from positive to negative photoresist and also includes anti-reflective and etch-resistant coatings. The laser-based exposure process is generated by a series of lenses and mirrors as well as a high-intensifying imaging device. The laser-based exposure process utilizes a unique combination of linear optics and alignment technologies to allow for greater precision and repeatability. Variable structure imaging technology is also available, which allows for imaging at different heights on the substrate in order to create a 3D effect. The exposure tool can also be configured with multiple wavelength optics to accommodate a wide variety of photoresist materials. TOKYO ELECTRON Lithius is compatible with a host of existing imaging systems, as well as current and upcoming equipment. It also provides extensive asset flexibility for accommodating multiple wafer sizes and substrates. Additionally, the model is backed by a robust customer service network and factory service support. Overall, Lithius is ideal for fabricating cutting-edge semiconductor structures. Its user-friendly interface, adjustable linear stages, powerful imaging systems, and multi-wavelength optics make it an ideal equipment for precision lithography processes. The system can easily meet the requirements for the development and production of various devices.