Used TEL / TOKYO ELECTRON Lithius #9355521 for sale

TEL / TOKYO ELECTRON Lithius is a photoresist equipment designed for processing semiconductor wafers. Photoresist is a light sensitive material applied to a surface in order to etch or develop patterns and structures into the substrate. TEL Lithius is built to provide precise substrate patterning with minimum contamination for critical processes. The core of the system is a proprietary light source that produces a collimated, uniform line of deep ultraviolet (DUV) light with a high intensity. This light source is used to directly expose the photoresist layer with a controlled amount of optical energy. The patterning of the substrate is then done in a closed-loop environment that ensures accuracy and minimal variations. TOKYO ELECTRON Lithius also includes an automatic temperature compensation unit that regulates temperatures of the substrate to optimize process parameters. The machine is modular, enabling the user to customize the tool to meet each specific application. It comes with a variety of modules that are tailored to process various types of substrates. These modules include a vacuum chuck, spinner, track, and scanner. The vacuum chuck acts as a platform for the substrate to be transferred and sealed in. The spinner module is used to spin the substrate as the light source illuminates the photoresist in a 360-degree pattern. The track module is used to move the substrate in the required pattern. It tracks the position of the light source and substrate in order to move the substrate accurately. The scanner module can be used to process large substrates to generate extremely small patterns. Lithius' automated software allows users to easily program specific patterning settings. It uses artificial intelligence algorithms to suggest optimized settings for faster processing. The asset also includes a "Teach and Repeat" feature that allows users to quickly program complex patterns. All of these features make TEL / TOKYO ELECTRON Lithius model a powerful and reliable tool for complex and precise substrate patterning. Its robust design and versatile modules make it well adapted to various applications, from semiconductor processing to medical applications.