Used TEL / TOKYO ELECTRON Lithius #9358674 for sale

TEL / TOKYO ELECTRON Lithius is a photoresist equipment for semiconductor fabrication. Photoresist is a light-sensitive polymer which, upon exposure to radiation, undergoes a chemical reaction to produce an altered form of the material whose properties make it suitable for application in the semiconductor industry. TEL Lithius system specializes in photoresist processes relating to lithography in the semiconductor industry. It utilizes a resist-decomposing projector to expose a substrate with an infrared light source. The projector can also be equipped with a laser scanner to irradiate the photoresist with a finer level of detail. The unit controls exposure times, light intensity, and focus precision with high accuracy. It is also capable of controlling photoresist such as alignment, surface defect control, and preliminary pretreatment. During the process, the degrees of temperature and humidity are strictly controlled to ensure uniform results, even when the environment changes. The exposure machine can be integrated with an automated assembly line. It supports a wide variety of substrates, with user-defined settings for each job. It can be used for low volume production with an appropriate configuration. It provides the user with advanced technology, such as laser beam writing and electron beam drawing. In order to ensure the highest quality of results, the tool is designed with a field-proven data asset. It allows users to access in real-time during the exposure process, as well as to review the post-exposure data in a secure model. The equipment features high precision, high throughput, and data protection for product security. It delivers superior results across a wide range of jobs, from concept-to-manufacture applications. To help support its users, the system provides ongoing technical support, professional consultation services, and advanced troubleshooting. TOKYO ELECTRON Lithius photoresist unit is an ideal choice for any semiconductor production environment. It offers a high level of precision, a streamlined approach to production, increased throughput, and data security. With its advanced features, it is an excellent choice for any application that requires photolithography for the production of semiconductor devices.