Used TEL / TOKYO ELECTRON Lithius #9362296 for sale

TEL / TOKYO ELECTRON Lithius
ID: 9362296
Wafer Size: 12"
Vintage: 2005
Coater / Developer system, 12" 2005 vintage.
TEL / TOKYO ELECTRON Lithius is a photoresist equipment used for the development of integrated circuits (ICs), thin-film transistors (TFTs) and microelectromechanical systems (MEMS). The system utilizes a combination of photolithography, etching and coating techniques to create intricate patterns on silicon wafers, which are then used to produce complex IC, TFT and MEMS devices. TEL Lithius unit starts with an unmasked wafer, on which the photoresist is applied. Photoresist is a light-sensitive material that is used to create lithographic patterns on the wafer. A light source, such as a maskless projector or a contact printing tool, is then used to expose areas of the wafer to light patterns or images. After the exposure is complete, the wafer is then heated in a post-exposure bake, which hardens the exposed area of the photoresist. The non-exposed portion of the photoresist is then removed using a chemical or water developer. This leaves a pattern of exposed photoresist that can be used for further processing. The next step is etching, in which the exposed pattern is transferred to the underlying substrate using a plasma, ion mill, reactive ion etcher (RIE) or other technique. This etching step removes impurities and patterned photoresist from the wafer, creating tiny features on the substrate. Finally, the patterned wafer is coated with a thin film of metal or other material using physical vapor deposition (PVD) or chemical vapor deposition (CVD). This layer protects the underlying wafer while adding electrical or mechanical properties, such as electrical conductivity or ability to flex, to the device. TOKYO ELECTRON Lithius machine is an important tool for the production of modern ICs, TFTs and MEMS due to its capability to create intricate patterns on the wafer with high precision. The available masks, light sources and chemical etchants enable the tool to produce highly precise 3D structures with feature sizes reaching nanometer-level resolution. This asset is one of the essential tools for creating the next generation of electronics and microsystems.
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