Used TEL / TOKYO ELECTRON Lithius #9378255 for sale

TEL / TOKYO ELECTRON Lithius
ID: 9378255
Wafer Size: 12"
Vintage: 2005
Coater / Developer system, 12" 2005 vintage.
TEL / TOKYO ELECTRON Lithius is a photoresist equipment used for resist processing in the semiconductor and microelectronics industry. The system allows for high resolution patterning of metalization, isolation, and other features down to ultra-fine line widths of 0.12µm. The unit is comprised of three main components: a photoresist spin coating machine, an exposure unit, and a hot plate for developing photoresist films. The photoresist spin coating machine is used to uniformly coat a thin layer of photoresist on a substrate. This thin layer acts as a mask for subsequent etching. The spin coater can be programmed to spin at different speeds and directions depending on the desired layer thickness and uniformity of coating. The photolithography exposure unit uses UV light to hardened the photoresist in the areas of the substrate where the UV light touches. This allows for precise formation of patterns since the UV light can be directed in the shape desired. The exposure unit is typically either a single photomasker or a photoaligner capable of exposing both pattern faces of the mask. The masker uses a single reticle while the aligner uses dual reticles for wafer-level exposure. The hot plate is the final component of the machine and is used for baking and then developing the photoresist. During this process, the photoresist is heated and exposed to a developer solution, which removes photoresist in the exposed areas to form a pattern. The plates typically heat up to temperatures up to 200°C, which is required to drive the chemical reaction. Overall, TEL Lithius is an efficient tool for complex photoresist patterning. The asset provides high resolution patterning along with simple programming to allow for user flexibility. By combining the three components of coating, exposure, and heat bake/development, the model achieves pattern formation with high resolution and excellent uniformity. This allows for high quality semiconductor and microelectronic devices to be created with fine detail.
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