Used TEL / TOKYO ELECTRON Lithius #9397192 for sale
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ID: 9397192
Wafer Size: 12"
Vintage: 2005
System, 12"
Material / Chemical:
Operating system: LINUX / Windows
SMIF
Hard Disk Drive (HDD) missing
Process: HT-PYRO (1250C)
Safety: TEL Standard
Layout type: U/Box
Tool direction: LL
Front furnace body: Coating (FDP Standard)
Heater [Range of temperature]: High VMU-40-007EXT(41) [850-1250°C]
Process:
Pressure: ATM
Temperature: 1250°C
Wafer / Cassette transport:
SEMI Standard - Notch, 12"
T/S Wafer jump out detection
Fork type / Material: 1+4 / Al203
Wafer In / Out order: ED -> P -> M / M -> P -> ED
Cassette:
Miraial (MK-823S-H)
Slot: 26
Stocker: 21
Monitor cassette:
In P1, P2, M / Out P1, P2, M
Fork :
Wafer detection
Wafer displacement detection
Pitch conversion
Hardware composition:
Load module:
(4) TEL / SEMES Standard load ports
(1) TEL / SEMES Standard loader arms
Transfer module (platform):
(5) TEL / SEMES Standard transfer robot arms
Process module:
TEL / SEMES Chamber process module specification
(17) Pumps
RF Generator
Gas box
PC
Utility:
Distribution panel
THC
Chiller
(2) Chemical boxes
ETC
Parts and tool
Module:
(4) PM1 Soft bakes
(5) PM2 PEB
(5) PM3 Hard bakes
(3) PM4 ADH
(5) PM5 COT
(5) PM6 DEV
(1) PM7 WEE
(1) PM8
(1) PM9
Litho tool:
Lens
Laser
Light source
Alignment
Power
2005 vintage.
TEL / TOKYO ELECTRON Lithius is a leading-edge photoresist equipment used in the fabrication and production of semiconductor and other electronics-related components. Photoresist is a light sensitive polymer used in a variety of microfabrication and photolithography processes. TEL Lithius system is comprised of four main components: liquid Crystal Display (LCD) imagesetter, an aligner, stepper tool, and track unit. The LCD imagesetter uses advanced optics to generate a high-precision image mask. The image data generated, known as a layout, is programmed into the LCD display. The layout is then projected onto the photoresist-coated wafer and the lithographic process begins. To ensure pinpoint accuracy, the LCD imagesetter has been tested out to 8x magnification and has an alignment accuracy rate better than 1 micron, which is important in the production of precise components. The aligner is used to precisely position the photoresist-coated wafer onto the stepper tool. This is performed with a vision machine and a wafer handler, both of which are capable of moving the wafer quickly and accurately in a sequence of predetermined steps. The aligner also utilizes a local electrode atomizer (LEA) tool to minimize the disruption of patterns while photoresist-coated wafers are being aligned. The stepper tool is the heart of the asset. It consists of an advanced stepper head with a motorized base, precision stage and a high-resolution microscope. The stepper head is responsible for controlling the illumination and powering the stepper tool, while the base enables safe and precise movement of the wafer. The microscope allows for positioning and alignment of the photoresist-coated wafer and is capable of imaging features as small as one-tenth of a micron in size. The last component of TOKYO ELECTRON Lithius model is the track equipment. This is responsible for the distribution of chemicals used during the photolithographic process. The track is a platform system which distributes chemicals, such as andeveloper and photoresist, to appropriate workstations in a precise, ordered sequence. This helps to ensure the uniformity and accuracy of the production process. In summary, Lithius unit is a state-of-the-art photoresist machine used in the production of semiconductor and other electronics-related components. Its LCD imagesetter provides precise image positioning and alignment, while the aligner facilitates accurate positioning of the photoresist-coated wafer. The stepper tool ensures precise imaging and control, and the track tool distributes chemicals in an orderly and uniform fashion. Together, these components ensure that photoresist-coated components are produced correctly and efficiently.
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