Used TEL / TOKYO ELECTRON Lithius #9397193 for sale
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ID: 9397193
Wafer Size: 12"
Vintage: 2012
System, 12"
Material / Chemical:
PR, HMDS, Thinner, DEV
ArF Sub-process
Operating system: LINUX / Windows
SMIF
Hardware composition:
Load module:
(4) TEL Lithius load ports
(1) TEL Lithius loader arm
(5) TEL Lithius transfer robot arms
Process module:
Chamber
Pump
RF Generator
Gas box
PC
Utility:
Distribution panel
THC
Chiller
Chemical box
ETC
Parts and tool
Module:
(8) PM1 Soft bakes
(4) PM2 ARC bakes
(8) PM3 PEB
(3) PM4 Hard bakes
(3) PM5 ADH
(5) PM6 COT
(5) PM7 DEV
(1) PM8 WEE
PM9
Litho tool:
Lens
Laser
Light source
Alignment
Power
Process: HT-PYRO (1250C)
Safety: TEL Standard
Layout type: U/Box
Tool direction: LL
Front furnace body: Coating (FDP Standard)
Heater (Range of temperature): High VMU-40-007EXT(41) [850-1250°C]
Process:
Pressure: ATM
Temperature: 1250°C
Wafer / Cassette transport:
SEMI Standard - Notch, 12"
T/S Wafer jump out detection
Fork type / Material: 1+4 / Al203
Wafer In / Out order: ED -> P -> M / M -> P -> ED
Cassette:
Miraial (MK-823S-H)
Slot: 26
Stocker: 21
Monitor cassette:
In P1, P2, M / Out P1, P2, M
Fork :
Wafer detection
Wafer displacement detection
Pitch conversion
Missing parts:
S/V ADH256 Chamber coat error
DEV303 AOV Bath rinse
DEV303 AOV Firm rinse
IRAS R-Axis driver
Port clamp cylinder
COT201, COT203 Spin chuck
LHP Temperature board
Mapping arm assembly
WEE Fan
L-Arm Z-motor
IRAS Z-Driver
IRAS Y-Driver
IRAS X-Driver
IRAS X-motor
UPS Battery swap
Control power supply swap
EC Controller swap
CRA Cover, ITL Switch
Ejector
Y-Driver
X5 Cable
DEV 301 Spain I/O Board
(2) Borads, COT MTR
4-Ports assembly
Hard Disk Drive (HDD)
2012 vintage.
TEL / TOKYO ELECTRON Lithius is a photoresist equipment that is used in a variety of manufacturing processes. Photoresist systems are used to prepare and process a substrate for further processing or manufacturing steps. TEL Lithius is a next-generation photoresist system made by TEL, a technology solutions provider. The unit allows customers to develop a resist process in a few steps. It can provide accurate patterning control, while improving resolution and depth of focus in high-resolution microlithography. The machine can increase process throughput and improve yields in various photolithography processes. TOKYO ELECTRON Lithius is capable of performing advanced lithography techniques, such as thin-film imaging, deep-ultraviolet lithography and atom-beam lithography. It also supports photopatterning, a technique where a single mask is used to pattern high-resolution patterns on a single wafer. The tool utilizes several advanced technologies, including an electron beam source, solid immersion lenses, variable numerical apertures, and an integrated objective projection lens. This combination of technologies allows the asset to produce higher resolution and finer patterns compared to other photoresist techniques. The model is designed to be easy to use and operate, allowing customers to select parameters or recipes that can be quickly changed to adjust the process. The equipment offers customers with a degree of flexibility that can be tailored to their specific needs. The system offers enhanced film thickness control, a larger beam current envelope, and improved substrate material performance. These features provide customers with improved throughput and accurate patterning results. Lithius is ideal for chipmakers and other manufacturing applications, such as organic photovoltaic modules, high-density interconnects, microfluidics, and advanced substrates. The unit can be utilized for a variety of processes, including implantation, patterning, and dry etch and wet etch. Overall, TEL / TOKYO ELECTRON Lithius is a powerful and versatile photoresist machine that is designed to streamline and improve photolithography processes. It is an ideal solution for customers looking for an advanced tool with improved throughput and better yields.
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