Used TEL / TOKYO ELECTRON Lithus #9290887 for sale

TEL / TOKYO ELECTRON Lithus is a photoresist equipment designed to enable high definition lithography in the fabrication of nanoscale structures. This system is capable of up to a 10-nm resolution, making it ideal for large-scale integrated circuit (LSI) production as well as nano-scale research and development applications. The unit consists of a machine that uses an optical lens to project light through a film of photoresist that coats the substrate. The tool is calibrated to direct the light at a specific angle, creating a pattern of illuminated photoresist. Photoresist is a light-sensitive material that reacts differently when exposed to light. By varying the composition and exposure of photoresist, it is possible to control the chemistry of the pattern that will be made on the substrate. The asset can be further adjusted with a number of advanced features including the ability to control the light intensity, tilt of the lens, or even generating patterns from an external source. These features enable the user to create more accurate patterns according to their needs. The model is further equipped with a motorized substrate adjustment stage, which can also be used to optimize the substrate for optimal resolution. TEL Lithus equipment also provides an automated substrate positioning system that helps monitor the accuracy of the substrate placement during the exposure process. This allows users to achieve precise alignment to nanometre tolerances. The unit is further designed to have a high throughput rate, with automatic processing capabilities, enabling the user to batch process large numbers of substrate. In addition, the machine can be used to monitor the quality of the patterns it generates, while providing a user-friendly interface for easy operation. The user can quickly set up the process parameters, and the tool is capable of automatically adjusting the settings during operation depending on the desired results. Furthermore, advanced analysis such as FRAP (fluorescence recovery after photobleaching) and EELS (electron energy loss spectroscopy) following the exposure process can also be carried out using the asset. Overall, TOKYO ELECTRON Lithus model is an advanced photoresist equipment that is designed to create high-definition patterns for nano-scale applications. The combination of its advanced features and automation capabilities make this system highly efficient for creating high-precision photomasks and producing high-quality nanostructures with superior accuracy.