Used TEL / TOKYO ELECTRON Mark 7 #143980 for sale

ID: 143980
Wafer Size: 8"
Vintage: 1995
Coater / Developer system, 8" Process: PIX Coat Software Version: MK807.38 System Power Rating: 208 VAC 3-Phase Loading Configuration: 4 Loader Uni Cassette System configuration: Clean track Mark7 Mark 7 main body Carrier station 1 x 4 side loading UPS applicable for AC power box upgrade Process station block High speed interface station for canon es3 Wafer edge exposure (wee) Inline thickness measurement system Car applicable system closed environment Solvent supply system for cot unit (CSS to 3 liter buffer tank*2 sets auto supply system) Dev solution supply system (CSS to 3 liter buffer tank*2 sets auto supply system) NH3 monitor specification Photo resist coater unit (2 cups) (1 nozzle per cup with RDS pump for cot 2-1, 2-2 & 2-3) (1 nozzle per cup with cyber pump for cot 2-1) Coater cup temperature synchronized control system Developer unit (2 cups) (E2 nozzle + normal rinse nozzle; 1set) Degas module installation Adhesion unit (ADH) Hot plate Cool plate Precision hot plate (PHP) Precision chilling hot plate (PCH) Air control kit for PCH & PHP Trancision chilling plate (TCP) External chemical cabinet Temperature & humidity controller esa-4 (CAR) Temperature control unit (TCU) Software options On-line software (TEL-GEM standard) Advance cascading software option Parallel processing software option Process log software option TEL S2-93 safety specification 1995 vintage.
TEL / TOKYO ELECTRON Mark 7 Photoresist Equipment is a system used to create images on semiconductor wafers. This unit uses two different types of photoresists, Positive Tone and Negative Tone, to coat a wafer with light-sensitive materials that react to different wavelengths of light depending on which type is used. The machine combines two different technologies to create an image on the wafer: Photo Masks and Direct Write. Photo masks are patterns that are printed onto a sheet of film. The film then sits between the light source and the wafer, and depending on which type of photoresist is used, the light will be blocked or allowed to pass through the mask to affect the photoresist on the wafer. Direct Write is a computer-controlled tool that uses a fine, focused beam of light to draw patterns directly onto the wafer. TEL MARK7 Photoresist Asset consists of several components, including a Mass Flow Module (MFM), Loadlock and Orientation Model, Spinner, Robot Type Auto Changeover Equipment (RTCS), Mask Aligner, and Direct Writing System. The MFM measures several parameters related to the beaker of photoresist, such as temperature, gas flow rate and pressure, and adjusts them as needed. The Loadlock and Orientation Unit places the wafers in the designated positions in the spinner. The Spinner spins the wafer at high speed to provide a uniform coating of photoresist on the surface. The Robot Type Auto Changeover Machine automatically replaces used beakers of photoresist with fresh ones. The Mask Aligner receives the film masks and focuses them onto the wafer. Lastly, the Direct Writing Tool uses a laser to draw patterns onto the wafer according to predetermined parameters. Unwanted photoresist is then removed using a cleaning process, which usually involves a mixture of acids. The entire process takes only a few seconds and is capable of producing submicron features. TOKYO ELECTRON MARK-7 Photoresist Asset is one of many systems used to create images on semiconductor wafers for the manufacturing of integrated circuits. It is very precise, reliable, and efficient, and has revolutionized the semiconductor industry.
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