Used TEL / TOKYO ELECTRON Mark 7 #9026272 for sale

TEL / TOKYO ELECTRON Mark 7 is a photoresist equipment designed for state-of-the-art applications in semiconductor device fabrication. The system is based on Field Effect Imaging (FEI) lithography technology, wherein a thin film of photo resist is formed over a silicon substrate and selectively exposed to light using an electron column. Photo resist is illuminated with a narrow beam of electrons, while the intensity of the electron beam is modulated to produce a two-dimensional patterned image defined by a reticle. The photo resist exposed to the beam is selectively hardened, whereas the non-exposed photo resist is removed by using a solvent. This process is repeated to create the necessary sub-micron features for the device's fabrication. TEL MARK7 features advanced pattering capabilities, including the ability to produce features that last down to 0.1 microns (100 nanometers). As such, the unit is well-suited for sub-micron level feature fabrication and high throughput production. The machine is also capable of high performance Post Exposure Bakes (PEB) capabilities, enabling post-exposure patterning at temperatures of up to 1000°C (1832°F). This is particularly useful for high temperature processes such as aluminium implantation and tungsten deposition. TOKYO ELECTRON MARK-7 also features a wide range of process options for exposures and PEBs. Modulation Transfer Function (MTF) is an important feature within these process options, which allows for precise determination of exposure dose through the use of dynamic measurement capability and highly linear process curves. On-board calibrations are provided to reduce the user's time on setup and improve throughput. Other useful features of TEL MARK-7 include integrated autofocus and recirculation pumps for improved process repeatability, as well as flexible robot-ready end-effectors. An easy-to-use graphical user interface enables users to monitor tool performance and setup their own process parameters easily. Accurate monitoring of process parameters means that malfunctions in process can be identified quickly and rectified, thereby reducing the risk of product contamination and yield failures. The asset is highly expandable, with options to add accessories in line with increasing throughput requirements, such as additional supply tanks for process chemicals. It also features temperature uniformity options, allowing for uniform substrate temperature over the whole exposure area. Altogether, TEL / TOKYO ELECTRON MARK-7 model is an ideal solution for sub-micron manufacturing and high throughput production. It is able to quickly and accurately create precise features down to 0.1 microns, while its integrated features and user-friendly controls reduce setup time and improve repeatability.