Used TEL / TOKYO ELECTRON Mark 7 #9098200 for sale

TEL / TOKYO ELECTRON Mark 7
ID: 9098200
Wafer Size: 6"
Vintage: 1995
(1) Coater / (2) Developer System, 6" (1) Scr 1995 vintage.
TEL / TOKYO ELECTRON Mark 7 is a photoresist equipment that serves as an essential piece of equipment in semiconductor manufacturing industries. This system allows for photolithographic processes, enabling the creation of structures on a microscopic scale. TEL MARK7 is an integrated photoresist unit, meaning that it has multiple components, all of them integrated with each other to form one entity. Some of these components include a photoresist spin, a wafer transport, and a process chamber. The photoresist spin applies solvent, photoresist, or chemicals to the semiconductor wafer surface to enable the photolithographic process. The wafer is then transported by the wafer transport to the process chamber, where it is exposed to ultraviolet radiation. Through this process, the photolithographic pattern is formed. TOKYO ELECTRON MARK-7 integrates rinse and spin-dry modules for easy cleaning of the semiconductor wafer after the photolithographic process. This consists of two steps: rinse and spin-dry. The rinse module removes all the chemicals and material from the wafer, while the spin-dry module removes any excess residue or liquid. In addition, TEL Mark 7 has a variety of built-in features that ensure it is capable of performing a variety of different photolithographic processes. This includes the ability to etch different areas of the wafer with chemical materials, control the process parameters, automate patterns, and provide precise wafer positioning while the photolithographic process takes place. Overall, TOKYO ELECTRON Mark 7 is an effective and reliable photoresist machine for manufacturing semiconductor components. Its integrated photoresist components offer maximum efficiency by facilitating a complete photolithographic process in one unit, including rinse and spin-dry modules. Furthermore, this tool provides a variety of built-in features that enhance the photolithographic process, ultimately allowing for better quality product.
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