Used TEL / TOKYO ELECTRON Mark 7 #9098203 for sale

TEL / TOKYO ELECTRON Mark 7
ID: 9098203
Wafer Size: 8"
(1) Coater / (2) Developers system, 8".
TEL / TOKYO ELECTRON Mark 7 photoresist equipment is a state-of-the-art patterning technology used in a variety of semiconductor device fabrication processes. The system combines advanced photolithography and etching technology with pioneering photoresist chemistry to yield a highly precise and accurate dry etch process of less than one hundred nanometers. TEL MARK7 unit employs a unique photoresist film design which exhibits a superior resistance to highly aggressive dry etch chemistries, while still affording a high resolution as small as 0.1 um on delicate substrates. The photoresist material can be tuned to handle different dry etch processes, such as reactive ion etching (RIE), ion-mill etching, and plasma etching, depending on the application requirements. Additionally, the machine can be configured for a variety of photoresist coatings, including positive and negative tone photoresists, as well as chemically amplified photoresists that allow for even higher resolutions. TOKYO ELECTRON MARK-7 litho-etch tool is designed to offer superior accuracy and repeatability of structures etched to less than one hundred nanometers. The asset features proprietary laser-scanning technology allowing for precise alignment of the wafer, eliminating prohibitively expensive mask misalignments due to etching and post-processing. TOKYO ELECTRON Mark 7 also features improved feature profile accuracy and rapid post-etch removal of dry etch byproducts, resulting in faster turn-around times and improved yields. Moreover, the model has been designed and tested to meet all applicable environmental requirements, such as the EU's RoHS Directive and REACH Regulation. Finally, TEL/TOKYO TEL MARK-7 equipment offers a comprehensive software package to support the photoresist patterning process. Advanced software tools, such as automated resist trimming and optical proximity correction (OPC) tools, facilitate high-accuracy patterning and precise OPC for tight design layout requirements. An integrated mask-less technology further enhances the process capabilities of TEL / TOKYO ELECTRON MARK7 system, allowing for fast and cost-effective device integration.
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