Used TEL / TOKYO ELECTRON Mark 7 #9098207 for sale

TEL / TOKYO ELECTRON Mark 7 photoresist equipment is a programmed device used primarily in the semiconductor fabrication process, enabling users to accurately develop photoresist material on wafers in precise shapes and sizes. This system is ideal for production of sophisticated integrated circuits featuring extremely fine details. TEL MARK7 is driven by an optimized data processing unit with a high-speed CCD image capturing device that reads data from a wafer's logic layer in mere seconds. It then sends the data to a central controller unit, which processes and sends instructions to the robot controllers. This enables rapid processing of material in a highly accurate and precise manner. The data acquired from the CCD camera, along with the user-defined parameters are used to generate the photoresist development pattern. The robot controller then patterns the wafers according to the generated instructions. The result is highly-accurate photoresist coating that follows the exact specifications supplied by the user. TOKYO ELECTRON MARK-7 also offers advanced features such as pulsed laser intensity control, advanced cooling control, and an in-situ monitor that constantly observes and evaluates the photoresist coating quality. These features ensure the highest level of accuracy and precision in a wide range of photomask processing operations. TEL MARK-7 is capable of processing up to 180 wafers per hour, and is extremely user-friendly allowing operators to quickly and easily configure the machine settings. Furthermore, the machine features a double load locking machine that can safely guide wafers from the load ports to the treatment chamber without the risk of errors. Overall, TOKYO ELECTRON MARK7 photoresist tool is an immensely powerful device with a wide range of features that makes it ideal for the production of sophisticated integrated circuits with extremely fine details. Its automated data acquisition, processing, and development features, along with its high processing speeds, make it the perfect choice for batch processing of wafers with photoresist material.