Used TEL / TOKYO ELECTRON Mark 7 #9216078 for sale

TEL / TOKYO ELECTRON Mark 7 is an advanced photoresist equipment used in lithography during the production of semiconductor devices. The system integrates a state-of-the-art resolution photoresist tool and advanced imaging optics to deliver superior wafer imaging performance and resolution. TEL MARK7 unit is ideal for processing submicron level lithography applications. The photoresist machine includes a dedicated photoresist processor, which is used to apply uniform and accurate photoresist film to the wafer surface. It also includes a precision imaging optics tool, which is used to image the photoresist onto the wafer surface in nanometer resolution. The imaging optics includes a high-resolution objective, which provides superior diffraction-limited image quality on the wafer surface. It also includes a robotic gantry asset, which is used to accurately position the optics and provide automated scanning of the wafer surface. The photoresist model is computer controlled and enables users to program the imaging parameters to obtain a desired wafer pattern. The equipment is compatible with various popular lithography exposures techniques, including optical steppers, spin/dip coating and flood exposures. It also allows users to process wafers of varying sizes, such as large or small substrate format. TOKYO ELECTRON MARK-7 photoresist system is configured with an advanced gas jet unit, which is used to transfer photoresist material to the wafer during processing. This gas jet machine helps maintain uniform resist coverage on the wafer surface during the processing. In addition, the tool includes an anti-reflection coating module, which helps reduce the reflection of light from the wafer surface during imaging. TEL / TOKYO ELECTRON MARK7 photoresist asset is equipped with a temperature control model, which enables users to regulate the temperature of the lithography optics during imaging. It also includes a cleaning module, which is used to clean the resist material from the wafer surface after imaging. Overall, MARK-7 is an advanced photoresist equipment, capable of satisfying users' lithography imaging demands. It provides superior resolution imaging and a wide range of advanced features to enable users to efficiently produce high-quality semiconductor devices.