Used TEL / TOKYO ELECTRON Mark 7 #9216894 for sale

TEL / TOKYO ELECTRON Mark 7
ID: 9216894
System.
TEL / TOKYO ELECTRON Mark 7 photoresist equipment is a precision lithographic device used in the semiconductor and optoelectronic production processes. This system enables world-class sub-micrometer precision in the fabrication of devices with ultra-small features. The unit features high-fidelity projectors to accurately expose the photoresist layer. These advanced projectors are equipped with Optical Rhombic Prism (ORP) lens arrays, which can precisely focus the image while continually correcting distortion and effects from lens aberrations. The ORP lens array also provides a 4X reduction of the image size enabling precise 0.25um feature printing. TEL MARK7 machine is further enhanced with a sophisticated exposure control feedback loop tool. This enables micro-adjustments of the exposure per sub-field of the chip design. This provides a repeatable and high-accuracy exposure process which is critical for manufacturing at the nano scale. TOKYO ELECTRON MARK-7 has a proprietary feature-following photoaligner asset to ensure the chip's image remains in exact focus at the photoresist layer. This is especially important when printing ultra-small features, such as those <0.20um in size. TEL / TOKYO ELECTRON MARK-7 model has also been designed to reduce environmental impact and maintain a very clean working environment. It has a built-in dry gas circulation and filtration equipment to remove airborne contaminants, dust, and micro particles to avoid contamination. TOKYO ELECTRON MARK7 also has a vacuum abatement system to reduce volatile organic compounds and other vaporous emissions during the photoresist process. Finally, MARK7 unit is designed for easy maintenance and repair with high reliability to reduce downtime and facilitate 24/7 production. It has an up-time scheduler which allows users to perform maintenance check-ups and preventive maintenance without interrupting production. TEL Mark 7 is a precision lithographic machine that can produce ultra-small features with high fidelity, accuracy, and repeatability in a low environmental impact and reliable environment. This makes it an excellent choice for semiconductor and optoelectronic production.
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