Used TEL / TOKYO ELECTRON Mark 7 #9235180 for sale

TEL / TOKYO ELECTRON Mark 7 is a photoresist equipment designed to improve the precision and accuracy of lithographic processes. This system is well suited for photomask fabrication, semiconductor circuits, and functional components. It allows users to achieve high resolution photolithography patterns with a minimum of operator intervention. TEL MARK7 utilizes a powerful beam, allowing greater precision and higher resolution. This beam is often composed of ultraviolet (UV) light, which is capable of delivering lithography patterns with great accuracy. The UV beam also offers a wide selection of exposure parameters including field size, pattern size, and the number of exposures. The exposure parameters are easily adjustable, allowing users to dial in the exact settings for each job. TOKYO ELECTRON MARK-7 features integrated software that is used to control the processes. The software is intuitive and straightforward, and it enables users to quickly and easily set up marks, adjust settings, and input data into the unit. Furthermore, it allows users to save time by automatically managing exposure parameters across the substrate. This is especially useful in batch processing operations. MARK-7 also comes with superior positioning accuracy. With its integrated counting and processing systems, operators can easily adjust the position of their lithography patterns on the target substrate. This means that users can rapidly create clean designs without risking multiple exposures or excessive x-y movements. The machine can also be configured to meet various customer requirements. It can be programmed to accept a wide range of exposure parameters and exposure times, from microsecond to millisecond exposures. In addition, the tool can be tailored to fit into existing cleanroom setups. Overall, TOKYO ELECTRON Mark 7 is an advanced photolithography asset designed to meet the highest standards of precision and accuracy. With its powerful beam, intuitive software, and superior positioning accuracy, it is well-suited for precise and accurate photomask fabrication and semiconductor circuit production.