Used TEL / TOKYO ELECTRON Mark 7 #9235181 for sale

TEL / TOKYO ELECTRON Mark 7
ID: 9235181
Wafer Size: 8"
Vintage: 1997
Track system, 8" 1997 vintage.
TEL / TOKYO ELECTRON Mark 7 Photoresist equipment is a comprehensive, high-precision negative photoresist development system. It is ideal for use in large-scale image processing and analysis for PCBs, ICs, and other electronic components. The basic unit includes a photo-mask, a machine controller, an automatic specimen changer, and an integrated image monitoring tool. The asset controller is the main CPU for controlling TEL MARK7 model. It is capable of controlling up to three light sources, and offers a range of processed data management and image processing functions. TOKYO ELECTRON MARK-7's photo-mask can be used for masking, photosensitive layer formation, exposure and development. It has a light source with a power of up to 350mW/cm2 for masking and exposure. The photo-mask is used to remove unwanted regions of the mask and expose the photoresist areas to the light source. TOKYO ELECTRON Mark 7's automated specimen changer can hold up to 100 specimens at once and can easily perform numerous tasks such as masking, photosensitive layer formation, exposure, and development. The changer uses a high-precision, temperature-controlled robotic arm to manipulate the specimens and perform precision tasks with great accuracy. The integrated image monitoring equipment of MARK-7 system enables the user to analyze images and monitor the quality of the specimen images. The image-processing functions of the unit allow the user to adjust brightness, contrast, and other image parameters, as well as to integrate functions like colour imbalance correction, aspect and windowing functions, and false colour display. The application of TEL / TOKYO ELECTRON MARK-7 Photoresist machine ranges from the simple developing of photoresist patterns, to complex tasks such as 3-D photo lithography for the manufacture of ICs and lasers. Its precision and applications make Mark 7 an essential tool for the development of precise and fast photoresist systems.
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