Used TEL / TOKYO ELECTRON Mark 7 #9237076 for sale

TEL / TOKYO ELECTRON Mark 7
ID: 9237076
Wafer Size: 8"
Vintage: 1999
Track system, 8" 1999 vintage.
TEL / TOKYO ELECTRON Mark 7 photoresist equipment is an innovative polymer thin film deposition and etching system used in the fabrication of advanced electronic devices. This advanced unit is capable of creating sub-micron line patterns. The technology is based on a combination of chemical solution and plasma etching processes that are combined to form a single thin film deposition machine. The technology consists of a two-stage step-and-repeat process in which a resist solution is applied to a substrate. The first stage is a patterning step, in which a photomask is aligned and exposed onto the substrate. This exposure creates the desired pattern in the resist film. The second stage involves an etching step, in which plasma etching is used to create the desired features in the resist film. This process complete the pattern transfer from the mask to the substrate. TEL MARK7 photoresist tool has numerous advantages over conventional patterning processes, including higher resolution and finer feature size capabilities. It can also provide higher throughput rates, as well as improved accuracy and stability. The process is also versatile enough to allow for rework and adjustable feature sizes. The asset also offers an automated process, which consists of wafer handling, alignment, and focus adjustment. This automation helps to reduce the manpower costs and improve the repeatability of the process. It also increases the efficiency of the process, allowing for faster turnaround times. These benefits, combined with the model's high resolution and feature size capabilities, make TOKYO ELECTRON MARK-7 a highly reliable and sought-after solution for high-precision patterning processes. This equipment has been widely used in the production of advanced semiconductor and optoelectronic devices in the semiconductor industry.
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