Used TEL / TOKYO ELECTRON Mark 7 #9239698 for sale

ID: 9239698
Wafer Size: 8"
Vintage: 1996
(3) Coater system, 8" Automation component: HSMS Inline flow: Right 1996 vintage.
TEL / TOKYO ELECTRON Mark 7 is a state-of-the-art photoresist equipment designed to optimize the precision, speed, and yield of multilayer semiconductor manufacturing processes. It utilizes advanced projection imaging and pattered photon technology to achieve aluminum etching with a resolution of less than one micron. The system can handle multiple layers of varying thicknesses by utilizing high-resolution optics to expose a photoresist layer down to the substrate. The exposure process uses two laser beams of different wavelengths, one for isotropic and another for anisotropic ablation. The unit has been configured with an improved layer-thickness control, allowing for increased pattern accuracy and etched surface quality. It also features a particle-free environment during its operation to ensure dielectric integrity and eliminate any chance of contamination. In addition, a dedicated remote management machine is included with TEL MARK7 for optimal control and oversight. This allows users to monitor, optimize, and adjust machine settings in real-time, reducing the need for manual processes. The tool can also be automated to move through the various processes faster and with more accuracy. Finally, TOKYO ELECTRON MARK-7 integrates with the customer's existing database infrastructure to provide rapid, repeatable photoresist operations with minimal downtime. TEL MARK-7 offers an ideal solution for high-precision, high-yield manufacturing of integrated circuit chips. It features a compact design, low operating costs, process control safeguards, and rigorous quality control. The use of the latest projection imaging and pattered photon technology in combination with automated controls makes TEL Mark 7 the premier photoresist asset on the market. With its improved layer-thickness control, particle-free environment, and automated process management, Mark 7 is the ideal choice for the highest level of photoresist applications.
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