Used TEL / TOKYO ELECTRON Mark 7 #9247333 for sale

TEL / TOKYO ELECTRON Mark 7 is a photoresist equipment. The system allows users to deposit a layer of photoresist on the substrate using a liquid-based or gaseous-based resist. In a photoresist unit, the photoresist is exposed to light. When the light strikes the photoresist, it changes the chemical structure so that certain portions become dark. This allows it to be etched into the substrate. TEL MARK7 machine is specifically designed for those seeking highly accurate and efficient depositing processes. TOKYO ELECTRON MARK-7 photoresist tool is equipped with TEL advanced controller asset, TOKYO ELECTRON Vision-PGC. This controller model is designed to allow the user to control and monitor the deposition process of the photoresist with its various stages. The vision-PGC controller also features an automated photoresist brush to precisely deposit the resist into tiny crevices and other difficult to reach areas. This equipment is also designed to track and record a deposited layer's thickness, uniformity, and uniformity of the surface of the photoresist over large areas. The advanced TEL / TOKYO ELECTRON Vision-PGC controller also allows users to set various parameters, such as the size of the area to be covered, the thickness of the deposited layer, the speed of the deposition, and the pattern to be deposited. Additionally, the controller system also allows users to modify the parameters if desired. TEL / TOKYO ELECTRON MARK-7 unit also provides accurate measurement and corresponding control of underlying layers before deposition. This helps users to precisely control the photoresist layer without creating any discrepancies. The machine also has a built-in edge coverage feature, which helps to avoid leaving any uncoated areas on the substrate. MARK-7 photoresist tool is an essential tool for electronics manufacturing. The asset is equipped with a powerful controller model, allowing users to manage the deposition process of photoresist as well as other parameters to end up with an accurate deposited layer. This equipment can provide users with a precise and efficient process of depositing photoresist on the substrate.