Used TEL / TOKYO ELECTRON Mark 7 #9247370 for sale

TEL / TOKYO ELECTRON Mark 7
ID: 9247370
Vintage: 1995
Track systems 1995 vintage.
TEL / TOKYO ELECTRON Mark 7 is a photoresist equipment, used for the development of photo-etched electronic parts. This system utilizes a highly advanced deep ultraviolet (DUV) lithography technology to produce high aspect ratio, high resolution features on small devices and substrates. TEL MARK7 unit has been proven to be a reliable and cost-effective tool for the development of electronic parts requiring a high degree of accuracy and precision. Using the machine, a photoresist, or a resist coating, is exposed to radiation of the correct wavelength for the photo-etch process. The radiation can either be provided by a source built into the tool, or by an external light source, such as a laser. The photoresist then undergoes a chemical reaction and hardens in the areas exposed to the light. After development, the hardened photoresist serves as a protective layer over the substrate, preventing etching in non-desired areas. TOKYO ELECTRON MARK-7 asset includes an 8inch scanning head with a depth of field up to 4 microns. It is capable of producing resolutions down to 1 micron and offers a varied set of exposure parameters to control the patterned features. For increased accuracy and throughput, the model includes the ability to perform simultaneous exposure and development processes. In addition, the equipment includes advanced pre-inspection functionality, which allows for the testing of photoresist before it is exposed to the required light. This allows the user to quickly identify any potential errors early in the process and reduce the risk of defects. TEL / TOKYO ELECTRON MARK-7 system is designed to enhance production time and reduce overall costs. Furthermore, the unit is compatible with many substrates and materials, making it ideal for a wide range of applications. The machine's user interface is easy to use and provides comprehensive support and assistance throughout the entire photoresist development process.
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