Used TEL / TOKYO ELECTRON Mark 7 #9409177 for sale

TEL / TOKYO ELECTRON Mark 7 Photoresist Equipment is a fully automated, high-precision system for processing photoresist films on semiconductor wafers. It utilizes an advanced control unit and proprietary algorithms to provide highly accurate processing of thin-film materials. The machine has a precision film application arm and a laser-optical high-resolution scanning device that can detect the thickness of deposited films and analyze the thickness distribution. It also provides a temperature control function to ensure consistent film thickness and temperature. The photoresist tool processes films onto the wafer in two steps. The first is film coating, wherein a thin-film material is deposited onto the wafer by the application arm in a single pass. This is followed by a photoresist-processing step. A laser-optical high-resolution scanning device is used to analyze the thickness distribution of the film and adjust the deposition accordingly. It can then detect the thickness of the deposited films and analyze the thickness distribution before transferring the photoresist material to the wafer. The asset also includes a temperature control function that provides consistent processing of the thin-film material. This function can be used to ensure a uniform film thickness and temperature throughout the processing. Temperature control is important for achieving stable, high-quality films. The thin-film layer is further processed using a photolithographic mask that is placed over the wafer. A high-power laser is then used to develop the photoresist material. This process is followed by a coating step, in which the wafer is exposed to a solution that makes the photoresist material selectively remove unwanted material on the wafer. The model can also process films with etching, where the unwanted material is etched away from the wafer. Furthermore, fine-pitch analysis involving the inspection of minute features can also be conducted. TEL MARK7 Photoresist Equipment provides reliable and accurate processing of films on semiconductor wafers. It is equipped with an advanced control system and proprietary algorithms that allow for consistent, high-precision processing of thin-film materials. By utilizing temperature control, it ensures a uniform film thickness and temperature for improved processing stability. Furthermore, the unit allows for convenient fine-pitch analysis, with the ability to inspect minute features on the wafer.