Used TEL / TOKYO ELECTRON Mark 8 #293751439 for sale

TEL / TOKYO ELECTRON Mark 8 is a "photoresist" equipment designed for multi-layer wafer production. The system is based on a three-axis alignment stage utilizing the latest projection optics and programmed beam denoising technology. TEL MARK8 is a highly configurable unit, with the ability to accommodate up to 32 systems per bank. With multi-level channeling systems, TOKYO ELECTRON MARK-8 offers flexible wafer management for highly complex applications and processes. TEL / TOKYO ELECTRON MARK-8 utilizes an auto masking and plate cassette machine for full patterned resist, PR mask and etching resist applications. The tool's high voltage supply, integrated stepper motor and filter controller also facilitate top-level applications and process stability. TEL / TOKYO ELECTRON MARK8 is designed to meet the challenge of rapid prototyping and rapid production in next generation lithography applications. The asset utilizes cutting edge optics, process control and programming techniques to achieve superior projection, resolution and pattern repeatability. MARK-8 is highly efficient in its design of light management, with separate exposure chambers and laser diodes, allowing users to reduce exposure times and deliver superior image quality. Additionally, the model utilizes a dedicated beam denoising filter, allowing users to achieve tighter pattern fidelity with minimal distortion. TEL Mark 8 is also equipped with a variety of safety features, such as an automatic gap recognition equipment, an automated comparison system and a safety monitor. The safety monitor ensures the unit is running at a desired operational window, and shut off if any fault conditions or excessive particle emissions are detected. Mark 8 provides a configurable platform for up to 8 tasks per machine and up to 4 tasks in a single cartridge. With these capabilities, the tool is designed to provide unparalleled levels of process efficiency and repeatability, offering an ideal platform to meet the demands of next generation lithography.